A New Two-Photon Lithography System: Nanoscribe at CeNSE 

Ky Multiscale Lunch & Learn Monthly Seminar Series

Presented by Dr. Todd Hastings,

 Center for Nanoscale Science and Engineering (CeNSE) - U. of Kentucky

A new two-photon lithography system, the Nanoscribe Photonic Profession GT is now available at CeNSE to all qualified users for both local and remote work. 

The Nanoscribe is able to print structures with two stage modes: the “galvo mode” which allows much higher speed building, but with less precise features (~400 nm in 2D lateral resolution) compared to the more precise “piezo mode”, which has ~300 nm 2D lateral resolution. Feature sizes on the Nanoscribe range from roughly one hundred nanometers up to several millimeters, having a maximum build height of 3 mm. The available print area depends on the sample holder used.

Learn more about this unique tool at our free “lunch & learn” seminar.

 Courtesy of KY Multiscale Nano Integration Node.