Wednesday, August 14, 2019 from 1:30 PM to 2:30 PM EDT
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This is an Online Webinar


Paul Joseph Ph.D. - Principal Research Scientist
Georgia Tech Institute for Electronics and Nanotechnology

SENIC Webinar: Elionix ELS-G100 100 kV Electron Beam Lithography System Enabling Nanotechnology

The Elionix ELS-G100 is a direct write electron beam lithography system that uses a 100 kV acceleration voltage and a 1.8 nm spot Gaussian beam to achieve nanometer scale resolution. This 30-minute webinar will provide an overview of the ELS-G100 system with a discussion of key features and capabilities followed by time for Q & A.

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